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ARL
(redirected from Anti-Reflection Layer)

    0.06 sec.
AcronymDefinition
ARLAssociation of Research Libraries
ARLArlington (Virginia, USA)
ARLArmy Research Laboratory (US Army)
ARLAustralian Rugby League
ARLAnimal Rescue League
ARLApplied Research Laboratory
ARLAir Resources Laboratory
ARLAuthority Revocation List
ARLAverage Run Length
ARLAirborne Reconnaissance Low
ARLAmerican Rights Litigators
ARLAdjusted Ring Length
ARLAttock Refinery Limited (Pakistan)
ARLAerospace Robotics Laboratory (Stanford University)
ARLAccess Rights List (Sprint)
ARLAeronautical Research Laboratory (Wright-Patterson AFB, Ohio)
ARLAviation Research Laboratory
ARLAgricultural Research Laboratory
ARLAcceptable Reliability Level
ARLAdmiralty Research Laboratory (UK)
ARLAquatic Research Laboratory (Lake Superior State Universary, Sault Ste Marie, Michigan)
ARLAerial Reconnaissance Low
ARLArctic Research Laboratory
ARLRepair Ship, Small
ARLAcceptable Risk Level
ARLAddress Resolution Lookup
ARLAnti-Reflection Layer
ARLAbove Rail Level (railway clearance measurement)
ARLArgentina Ley (national currency since1970; replaced by old Peso 1983)
ARLAttendant Release Loop
ARLAustralian Reference Laboratory
ARLAverage Revenue Lagged
ARLAlcoa Research Laboratory (New Kensington, PA)
ARLAcceptable Reinvestment Level
ARLAcceptance Reliability Level
ARLAuthorized Retention Level
ARLAviator Readiness Level
ARLAuto Repuestos Linares (Guatemala)
ARLAgricultural Research Labs
ARLArchived Redo Log
ARLAppliance Recovery Log
ARLAcronym Reference List


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? References in periodicals archive
The film front surface is coated with an anti-reflection layer, and formed on its back is a meshed layer of an electromagnetic shield.
BERLINER GLAS offers display panels made of glass or plastics with various functional features like single or double-sided optical or chemical anti-reflection layers, lamination with coated films, mesh films to avoid electromagnetic radiation (EMC), PVB films and silk screen printing with 2-component, UV or frit-ink colors.
During the fourth quarter, we continued to broaden our process portfolio with the announcement of a new anti-reflection layer (ARL) product for critical dimension (CD) control in advanced semiconductor devices.
 
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