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NEC Electronics pioneered the introduction of argon fluoride (ArF) immersion lithography. The two companies will work on both argon fluoride (ArF) excimer laser and extreme ultraviolet (EUV) lithography. The 3000th install Co an XLA 300 argon fluoride (ArF) excimer laser light source, designed to enable volume production of 45nm immersion photolithography applications Co was installed at a major Japanese memory chip manufacturer. |
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