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ALD
(redirected from Atomic layer deposition)

    Also found in: Encyclopedia, Wikipedia 0.03 sec.
AcronymDefinition
ALDAtomic Layer Deposition (method to produce conformal thin films)
ALDAlderman
ALDAtomic-Layer Deposition
ALDAlcohol(ic) Liver Disease
ALDAdrenoleukodystrophy (genetic disease)
ALDAlpha Lambda Delta (National freshman honors society)
ALDAssistive Listening Device
ALDAt a Later Date
ALDAssociation of Lighting Designers
ALDAlderney
ALDAcademy of Laser Dentistry
ALDArakan League for Democracy
ALDÀ l'Attention De
ALDAnoxic Limestone Drain (passive treatment for remediation of acid mine drainage)
ALDAssistant Lighting Designer (theatre)
ALDApproximate Lethal Dose
ALDAdults with Learning Difficulties (social services)
ALDAvailable-to-Load Date
ALDAppointment of Limited Duration
ALDAmerican Library Directory
ALDairborne laser designator (US DoD)
ALDAmerican Law Division (Congressional Research Service)
ALDAvailable Landing Distance (aviation)
ALDAccounting Line Designator
ALDArch Length Discrepancy (dentistry)
ALDAlarm Display
ALDAviation Logistics Department
ALDAcoustic Leak Detection
ALDAnalog Line Driver
ALDArrêt Longue Durée
ALDAcquisition Logistics Division
ALDAirborne Laser Demo
ALDAir Lift Division
ALDAviation Logistics Division
ALDAssembly Line Diagram
ALDAzimuthal Lithodensity (trademark of Halliburton)
ALDAdvanced Laser Designator
ALDAssign Local Distribution
ALDAverage Link Duration
ALDAccelerated Life Data
ALDAutomatic Louver Damper (HVAC systems)
ALDAutomatic Logic Diagram
ALDAcquisition Logistics Documents
ALDAircraft Logistics Department
ALDAvailable-to-Load Data


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? References in periodicals archive
In the deposition industry, advances in separation by implantation of oxygen (SIMOX), atomic layer deposition (ALD) for advanced nodes, and plasma source ion implantation (PSII) are expected for meeting the specific needs of sub-100 nm devices.
Novel wafer cleaning technologies to support advances in the ... by EDP Weekly's IT Monitor
Second Place ($1500) - Measurement and control of nanoamp level currents in the formation of nanoscale device electrodes (spacing in the 1-10nm range) using atomic layer deposition by Rahul Gupta of the University of Delaware (Newark).
Winners of Keithley Instruments Nanotech Measurement Contest Share ... by Business Wire
Aviza offers both front-end-of-line (FEOL) and back-end-of-line (BEOL) process applications including products for atomic layer deposition (ALD), diffusion and low pressure chemical vapor deposition (LPCVD) furnaces, atmospheric pressure CVD (APCVD), CVD, etch and physical vapor deposition (PVD).
Aviza Technology to Present at the Thomas Weisel Partners Tech2007 ... by Business Wire
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