CAIBEChemically Assisted Ion Beam Etching
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Advanced CAIBE and RIBE technologies that were once primarily research applications are now entering production.
Delivery and operational hand-over of a plant for ion beam etching of wafers and supported single substrates up to a diameter of 150 mm for installation in vacuum technology laboratory of the Institute for Solid State Electronics at TU DresdenKey requirements - Ion source: filament-ion source, the long-term stabilityIBE, RIBE and CAIBE processes possible.