Lot 13 - DUV
reticle ASM5500 4X / 300 + DUV
reticle ASM5500 4X / 1100
Building upon our expertise in developing the industry's most reliable EUV light source, Energetiq now offers a DUV
source that provides the highest power density available today for uniform illumination across a 300mm wafer or substrate.
The ELS-6010 incorporates numerous technological advances, including a new high voltage power supply, laser discharge chamber and wavelength stabilisation module to become the world's highest repetition rate production DUV
The ELS-6010 incorporates numerous technological advances, including a new high voltage power supply, laser discharge chamber and wavelength stabilization module to become the world's highest repetition rate production DUV
On a worldwide basis, Cymer maintains an installed base of over 800 DUV
lasers-equating to over a 90 percent share of the total excimer laser market.
Our value proposition entails offering advanced DUV
illumination technology at a low cost of ownership, while maintaining high quality and reliability standards that are backed by a comprehensive service and support program.
Cymer has consistently continued to grow its installed base of DUV
excimer lasers, thus increasing support requirements among chipmakers and lithography suppliers throughout Europe.
Performance Characteristics of Ultra-Narrow ArF Laser for DUV
Lithography" highlights Cymer's 193 nm developments in enabling higher NA lithography tools that are instrumental in imaging narrower line widths.
The Cymer DUV
Symposium provides an excellent opportunity for leading lithography technologists to share information on the state-of-the-art advances being made in advanced IC manufacturing," stated Chris Rowan, director of marketing at Cymer.
Excimer Laser Company to Establish Dedicated Training
The Applied UVision SP system's DUV
laser inspection technology provides a unique advantage in detecting immersion lithography-related defects.
Olympus systems can integrate 248 nanometer DUV
optics with a broad range of visible light imaging methods to increase the resolution limit of standard optical inspection to 80 nanometers.