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| ? References in periodicals archive |
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The MDZ(TM) process can be applied to any polished silicon wafer and to P/P- epitaxial wafers to provide a well-defined and predictable level of internal gettering and denuded zone depth during integrated circuit fabrication. The MDZT process can be applied to any polished silicon wafer and to P/P- epitaxial wafers to provide a well-defined and predictable level of internal gettering and denuded zone depth during integrated circuit fabrication. |
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