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ECMP |
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Introducing innovative electro-chemical mechanical planarization (Ecmp) capability on Applied's proven Reflexion LK platform, the new system is the industry's first and only CMP tool to provide this high-performance, cost-effective and extendible solution for copper/low k manufacturing at 65nm and beyond. nbsp;Ecmp(TM), a revolutionary electro-chemical mechanical planarization system that removes copper from the wafer with |
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