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nbsp;lithography, electron projection lithography, nanoimprint lithography, dip-pen lithography, e-beam, and specialist tools for nanotechnology, among others. and electron projection lithography (EPL) with their ability to pattern features as small as 32-nm are the prime contenders to replace optical lithography. The system shipped to Selete is the world's first full field electron projection lithography (EPL) tool and will initially be used for advanced 65 nm development. |
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