FEOL - What does FEOL stand for? Acronyms and abbreviations by the Free Online Dictionary.

Acronym

Definition

FEOL

Front End Of Line (semiconductor manufacturing)

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Papers are in sections on SiO2 removal and drying, surface chemistry of Si and Ge, FEOL selective wet etching and corrosion, FEOL photo-resist removal and substrate loss, particle removal and damage, contamination control, metrology, post-CMP cleaning, and BEOL and contact cleaning. Ultra clean processing of semiconductor surfaces 8; proceedings by SciTech Book News This technology has allowed ST to convert from its use of conventional piranha-based chemistry to the more benign DIO3 chemistry in almost all FEOL resist stripping and post-ash residue removal steps, nearly eliminating the use of sulfuric acid (H2SO4) and significantly reducing the use of hydrogen peroxide (H2O2). STMICROELECTRONICS PROCESSES ONE MILLION WAFERS USING FSI ... by EDP Weekly's IT Monitor Concurrently, a major Korean customer is evaluating the FSI ORION system for FEOL applications, including our patented ViPR[TM]+ technology that is being utilized to remove highly implanted photoresist with a unique one-step process," continued Mitchell. FSI International Receives Follow-on Order for FSI ORION[R] Single ... by Business Wire	FENOCIN FENPA FENPETROL FENRO FENS FENSA FENSI FENSUAGRO FENTL FENTO FENTRA FENU FENW FENY FEO Feø FEOA FEOAA FEOC FEOD FEOE FEOFS FEOG FEOGA FEOIA FEOL FEOM FEOMA FEONA FEOP FEORC FEORP FEOS FEOSA FEOSC FEOSH FEOX FEOY FEP FEP4 FEPA FEPABO FEPAD FEPADE FEPADI FEPAFUT FEPAGRO FEPALE FEPASA FEPAZ FEPB	feoffees feoffees feoffer feoffer feoffment feoffment feoffment feoffments feoffments feoffor feoffor feoffors feoffors Feofil Gavrilovich Ianovskii Feofil Ianovskii Feofilov, Petr Feofilov, Petr Petrovich Feofor FEOFS FEOG FEOGA FEOIA Feoktist Alekseevich Berezovskii Feoktist Berezovskii Feoktistov, Evgenii Feoktistov, Evgenii Mikhailovich Feoktistov, Konstantin Feoktistov, Konstantin Petrovich Feoktistov, Lev Feoktistov, Lev Petrovich FEOL Feolent FEOM FEOMA FEONA FEOP FEORC FEORP FEOS FEOSA FEOSC FEOSH Feosol Feosol FEOX FEOY FEP FEP FEP FEP resin FEP4 FEPA FEPABO FEPAD FEPADE FEPADI FEPAFUT FEPAGRO

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Papers are in sections on SiO2 removal and drying, surface chemistry of Si and Ge, FEOL selective wet etching and corrosion, FEOL photo-resist removal and substrate loss, particle removal and damage, contamination control, metrology, post-CMP cleaning, and BEOL and contact cleaning.

Ultra clean processing of semiconductor surfaces 8; proceedings by SciTech Book News

This technology has allowed ST to convert from its use of conventional piranha-based chemistry to the more benign DIO3 chemistry in almost all FEOL resist stripping and post-ash residue removal steps, nearly eliminating the use of sulfuric acid (H2SO4) and significantly reducing the use of hydrogen peroxide (H2O2).

STMICROELECTRONICS PROCESSES ONE MILLION WAFERS USING FSI ... by EDP Weekly's IT Monitor

Concurrently, a major Korean customer is evaluating the FSI ORION system for FEOL applications, including our patented ViPR[TM]+ technology that is being utilized to remove highly implanted photoresist with a unique one-step process," continued Mitchell.

FSI International Receives Follow-on Order for FSI ORION[R] Single ... by Business Wire