FUSIFind, Use, Share Information (telecommunications)
FUSIFirst Union Securities, Inc.
References in periodicals archive ?
be: IMEC shows potential of FUSI for low-power applications and its extendibility to high performance -- Device performance meets ITRS for 45nm
FUSI gate is regarded as a promising transition between current poly silicon gate electrodes and future dual work-function metal gates that require exotic materials and complicated processing.
Diffusion-less Junctions and Super Halo Profiles for PMOS Transistors Formed by SPER and FUSI Gate in 45 nm Physical Gate Length Devices