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FUSI |
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In the front-end program major breakthroughs have been achieved on the use of fully-silicided gates ( In the gate electrode area, for the first time, a unique strain engineering technique used to enhance performance on fully-silicided (FUSI), nickel silicide (NiSi) gates is being illustrated. In addition to highlighting leading research into metal and fully-silicided gate structures, a number of the IEDM papers contributed to by Philips examine ways of minimizing the impact of new materials or manufacturing steps on process complexity and cost. |
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