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The new 45nm process combines the most advanced 193nm immersion photolithography, competitive performance-enhancing silicon strains, and extreme low-k (ELK) inter-metal dielectric material. The advanced Applied Centura(R) Ultima HDP-CVD(R) is already system of record at both 65nm logic and 70nm memory customers for applications as diverse as shallow trench isolation (STI), pre-metal dielectric (PMD), inter-metal dielectric (IMD) and passivation fill. Even though the ISSCC paper detailed FTEOS in the back-end, Chipworks was surprised to find FSG as the inter-metal dielectric, since IBM's foundry publicity includes low-k dielectric. |
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