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Coating Application Techniques II-11 Sputtering II-11 Ion Beam Sputtering II-11 Magnetron Sputtering II-11 Coating Under Vacuum II-11 Thermal Vaporization II-11 Electron Bombardment II-11 Electron Beam Ion Bombardment II-12 Ion-Assisted Bombardment II-12 Ion Beam Deposition II-12 Electron-Beam Vaporization Deposition II-12 Physical Vapor Deposition II-12 Chemical Vapor Deposition II-12 The StratIon fxP system uses ion beam processing for the deposition of metal and dielectric thin films, and is the world's first ion beam deposition system for 300mm wafer manufacturing. Ion Beam Deposition tools are used in the fabrication of mask blanks - the base material for the stencil-like photomasks that are used to describe patterns on nanoelectronics wafers - and is essential for the deposition of ultra-thin layers of materials that are demanded in the EUV manufacturing process. |
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