IBE

(redirected from Ion beam etching)
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AcronymDefinition
IBEIdentity-Based Encryption
IBEIon Beam Etching
IBEIntegrated Business and Engineering (Lehigh University)
IBEInternational Bureau of Education
IBEInternet Booking Engine
IBEInternational Bureau for Epilepsy (est. 1961)
IBEInternational Beauty Expo (trade show)
IBEIntercultural Bilingual Education
IBEInstitute for the Built Environment (Colorado State University)
IBEIdentity Based Encryption
IBEInternational Business Enterprise
IBEInstitut für Medizinische Informationsverarbeitung, Biometrie Und Epidemiologie (LMU, Muenchen, Germany)
IBEInstitute of Biological Engineering
IBEInternational Business Enterprises
IBEInstitut Belge de l'Emballage (French: Belgian Packaging Institute)
IBEIberia, Lineas Aereas de Espana, Spain (ICAO code)
IBEID (Identity) Based Encryption (cryptography)
IBEInstitute for Behavioral Economics (Arizona)
IBEInstitute of Biomedical Engineering (UK)
IBEIsuzu Body Engineering (Japan)
IBEInboard Booster Engine
IBEInstitution-Based Exercise
IBEInfinity Bio-Energy Limited
IBEIndirect Battlefield Engagement System
IBEIntrahepatic Biliary Epithelium
IBEImpaired Biliary Elimination
IBEInternational Business Entity (Cyprus)
References in periodicals archive ?
Emmanuel Lakios, vice president and general manager of Veeco's Ion Beam Systems group, noted, "Last June, we reached a milestone with the shipment of Seagate's 100th ion beam etching system.
Since taking delivery of its first Microetch ion beam system, an ME-1001, some five years ago, Seagate has quickly become one of the world's largest users of ion beam etching systems for thin film head manufacturing.
is a worldwide leader in precision ion beam etching and deposition systems as well as surface metrology and industrial measurement equipment for microelectronics applications such as semiconductors, thin-film magnetic heads and flat panel displays.
NASDAQ:VECO), headquartered in Plainview, is a worldwide leader in precision ion beam etching and deposition systems as well as surface metrology and industrial measurement equipment for microelectronics applications such as semiconductors, thin-film magnetic heads and flat panel displays.
Research objectives and content The objectives of the project are: (1) Optimisation of High Temperature Semiconductors (HTS) dc- Superconducting Quantum Interference Devices (SQUIDs) device structures by submicron photolithography and ion beam etching in order to tune the critical current and enhance the dynamic resistance for application of APF.
Veeco's new DLC-350 and Veeco's Microetch(R) ion beam etching systems give thin-film magnetic head manufacturers both the deposition and etch technologies necessary to mass-produce low-flying, wear-resistant read-write heads.
Our record 1995 performance is the result of continued strong worldwide growth of our Ion Beam Etching and Surface Measurement products as well as expanded Industrial Measurement sales.
is a worldwide leader in precision ion beam etching and surface measurement and industrial measurement equipment for high growth microelectronic applications such as semiconductors, thin film magnetic heads and flat panel displays, as well as for a broad range of industrial applications.
24, 1996--More than 70 Microetch(R) Ion Beam Etching Systems from Veeco Instruments Inc.