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MERIE |
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TOKYO -- Tokyo Electron (TEL), the world leader in dielectric etch, announced today the release of UNITY(R) LS, equipped with TEL's award-winning DRM chamber, a MERIE style capacitively coupled plasma source. The company currently offers two plasma source technologies, MERIE and dual high frequency plasma etching. Built on the company's proven MERIE (magnetically enhanced reactive ion etch) technology and featuring a new design, the HART chamber is capable of etching uniform trenches with critical dimensions (CDs) measuring less than 80nm. |
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