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MOCVD |
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The new process technology enables the production of four-inch epitaxial wafers with high quality, which is not possible with the conventional MOCVD process. The study did reveal, in one sample set grown by MOCVD by an outside laboratory, unintentional fluctuations in the epilayer composition during growth (as confirmed by SIMS analysis), which increased t he oxidation rate. This solar cell conversion efficiency was achieved using a Veeco TurboDisc[R] As/P MOCVD System, which deposits epitaxial films. |
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