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PCVD
(redirected from Plasma Chemical Vapor Deposition)

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AcronymDefinition
PCVDPlasma Chemical Vapor Deposition


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? References in periodicals archive
It develops, manufactures and sells vacuum technology-related equipment such as organic electroluminescent (EL) manufacturing equipment, sputtering, heat deposition, and plasma chemical vapor deposition products.
With exclusively licensed commercial rights to nanotube technology developed at some of the world's most respected research universities, the NanoPolaris IP portfolio includes patents and patent applications claiming nanotube compositions of matter and general manufacturing techniques such as chemical vapor deposition synthesis, plasma chemical vapor deposition synthesis, purification, solubilization, separation of certain types of tubes, coatings, functionalization, and manipulation.
Barnes was general manager of the High Density Plasma Chemical Vapor Deposition Business Unit at Novellus Systems.
 
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