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PERIE
(redirected from Plasma Enhanced Reactive Ion Etch)

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AcronymDefinition
PERIEPlasma Enhanced Reactive Ion Etch
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Offers leading plasma source technologies including Plasma Enhanced Reactive Ion Etch (PERIE), Inductively Coupled Plasma (ICP) and M0RI(TM) within a unique single chamber package of high performance combined with low footprint and costs.
TRIKON DEBUTS DSI MODULE FOR DEEP SILICON ETCH PROCESSES by Electro Manufacturing
Offers leading plasma source technologies including Plasma Enhanced Reactive Ion Etch (PERIE), Inductively Coupled Plasma (ICP) and M0RI(TM) within a unique single chamber package of high performance combined with low footprint and costs.
Trikon Announces Robert Bosch GmbH Order for Omega FxP Etcher by Business Wire
Offers leading plasma source technologies including Plasma Enhanced Reactive Ion Etch (PERIE), Inductively Coupled Plasma (ICP) and M0RI(TM) within a unique single chamber package of high performance combined with low footprint and costs.
Trikon Announces New DSi Module for Deep Silicon Etch Processes for ... by Business Wire
 
 
 
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