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1) CVD = chemical vapor deposition Al = aluminum (2) STI = shallow trench isolation (3) PMD = pre-metal dielectric The advanced Applied Centura(R) Ultima HDP-CVD(R) is already system of record at both 65nm logic and 70nm memory customers for applications as diverse as shallow trench isolation (STI), pre-metal dielectric (PMD), inter-metal dielectric (IMD) and passivation fill. Applied's focus on cost-effective, low-downforce CMP technology has contributed significantly to customers' increased use of our CMP systems for all types of leading-edge interconnect structures, including the most advanced copper/low k designs, as well as performance-critical transistor steps like shallow trench isolation and pre-metal dielectric polishing. |
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