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Heau, HEF R&D; and "Nitrogen post-discharge assisted pulsed laser deposition of nitride thin films," M. Researchers at NIST have developed a novel dual-beam, dual-target pulsed laser deposition process for the fabrication of compositionally-graded thin film libraries. Specialized services include micromachining, marking and engraving, growth of thin films by pulsed laser deposition, and development of new applications of lasers to chemistry, photochemistry, and materials development and processing. |
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