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RF/DC |
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The new "any pin" RF/DC probe card design will allow higher test system throughput, because both RF and DC measurements can be made with a single wafer insertion, without the need to swap probe cards and load and align a wafer a second time. The LLS EVO II, a state-of-the-art batch sputtering system, provides optimum process flexibility with five sources each configurable for sputtering options including DC, RF, RF/DC, pulsed DC, and co-sputtering. |
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