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MII's proven, step and flash imprint lithography (S-FIL(TM)) processes, template fabrication support, template replication capability, and application expertise combine to produce a cost effective imprint lithography solution with best in class cost of ownership. MII's Step and Flash Imprint Lithography (S-FIL[TM]) technology replicates the ultra the world leader in Step and Flash Imprint Lithography (S-FIL(TM)) technology, announces sales of its Imprio(TM) 55 system, into Lawrence Berkeley National Lab's Molecular Foundry in California, the University of Texas at Austin (UT-Austin), and Pennsylvania State Nanofabrication Facility ( |
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