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TCVD
(redirected from Thermal Chemical Vapor Deposition)

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AcronymDefinition
TCVDThermal Chemical Vapor Deposition


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0 million to cover the effects of a reduction in its global workforce, as well as decisions to reduce its flat panel display and thermal chemical vapor deposition (CVD) operations, and to downsize and consolidate manufacturing operations.
Lam Announces Fiscal 1998 Third Quarter Results by Business Wire
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