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Steam is being used to grow thermal oxides on the backside for current isolation when used with backside contacts and form isolation layers between films and annealing of films to reduce defects and improve cell efficiencies. There are three ways to generate the water vapor needed for wet thermal oxide growth: pyrolytic from the combustion of hydrogen and oxygen, bubbling a carrier gas through hot water, and the direct injection of water vapor. nbsp;steam for thermal oxide and other semiconductor applications. |
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