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KLA-Tencor (NASDAQ:KLAC) today introduced the latest version of its industry-leading PROLITH lithography optimization product, PROLITH 10, enabling users to accurately predict lithography process windows for integrated circuit (IC) designs down to 32nm. MII), the leader in nano-imprint lithography, unveiled the latest addition to its Imprio line of imprint lithography tools today at the Strategies in Light trade conference. TOOL's Layout Visualization Platform, LAVIS, Combined with Brion's Computational Lithography System, Tachyon, Addresses All Stages in Design for Manufacturing Flow |
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