AACVDAerosol-Assisted Chemical Vapor Deposition
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Deposition of Ti[O.sub.2] Thin Film by AACVD. Ti[O.sub.2] thin films were prepared on the ITO substrates (1 x 1.5 cm) using the in-house AACVD assembly previously described [2].
By analysis of XRD patterns (Figure 1), it is observed that most of the peaks caused by the ITO glass slide are no longer visible after the AACVD process, indicating successful deposition of Ti[O.sub.2] onto the ITO glass slide (Figure 1(a)).
We first reported on the DSSC performance of mixed rutileanatase phase Ti[O.sub.2] thin films produced by the AACVD method.
Polymeric transducing platforms were fabricated using a commercial high heat resistant polyimide (Upilex-S, 125 [micro]m, UBE) to ensure thermal and chemical compatibility with AACVD process (Figure 1(a)).
Tungsten oxide films were grown on the top of polymeric transducing platforms via AACVD of tungsten hexacarbonyl at various temperatures (300, 325, 350, and 375[degrees]C).
AACVD of W[(CO).sub.6] resulted in the formation of adherent uniform films confined on the electrode area of the polymeric and silicon transducing platforms.
AACVD process includes the atomization of a liquid precursor solution (camphor oil) into fine submicrometer-sized aerosol droplets that distribute throughout the gaseous medium in the CVD with the aid of Ar gas as the carrier gas.
By using the AACVD method, the nanostructured a-C which is naturally p type was fabricated on n-Si substrate, and the characteristics were measured by a Bukoh Keiki CEP2000 solar simulator system as shown in Figures 5(a) and 5(b).
Thus the presence of efficiency value clarified the tendency of using the nanostructured a-C by AACVD as the absorber layer in carbon based solar cell.
Pure [Cr.sub.2] [O.sub.3] coatings and IF-W[S.sub.2]/[Cr.sub.2][O.sub.3] nanocomposite coatings were produced via AACVD and subsequent annealing at 500[degrees] C.
In the real AACVD process, the chemical reactions and intermediates will be more complicated than the interpretation for the dried precursor powder.
The deposition mechanism of AACVD with IF nanoparticles is proposed in Figure 6 and described as follows.