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ALDAtomic Layer Deposition (method to produce conformal thin films)
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References in periodicals archive ?
Abbreviations ALD: Atomic layer deposition EDS: Energy dispersive spectrum XRD: X-ray diffraction AFM: Atomic force microscopy SE: Spectroscopic [Al.sub.2][O.sub.3]: Aluminum oxide TMA: Trimethylaluminum T-L: Tauc-Lorentz F-B: Forouhi-Bloomer RMS: Root mean square RMSE: Root mean square error.
It is said to be especially suited in plasma deposition applications such as atomic layer deposition and chemical vapor deposition, as well as etch processes used to fabricate next-generation chips in the semiconductor industry.
To tackle this challenge, General Motors--a pioneer in applying surface coating using the Atomic Layer Deposition (ALD) technique--has developed several Ultrathin multifunctional hybrid coatings and processes.
The deposition of both the high-k dielectric HfSiO layer and 1.5 nm TiN metal gate was accomplished with Atomic Layer Deposition system.
Atomic layer deposition (ALD), one of the semiconductor industry's workhorse technologies, is responsible for creating ultra-thin films of exotic materials that allow so many of our appliances to work their electronic magic.
Atomic layer deposition (ALD) is a thin film deposition technique [1] increasingly used in the microelectronics industry [2,3] due to its ability to deposit uniform, conformal, pin-hole free thin films in high aspect ratio features with sub-nanometer thickness control.
SoLayTec provides atomic layer deposition systems used in high efficiency solar cells, including current and next generation structures such as p-type PERC and n-type.
"Eon-ID[TM] will specifically benefit industries using atomic layer deposition (ALD), optics, OLED, and any other process that requires precision control over very thin layers, especially at temperatures higher than 100[degrees]C.
Keywords Atomic layer deposition, Aluminum oxide, Surface contamination, Web handling, Polypropylene
The key enabling technology chosen to bridge this technological gap is atomic layer deposition (ALD) that allows an impressive quality of dielectric.