CD-SEMCritical Dimension - Scanning Electron Microscopy
References in periodicals archive ?
Semiconductor manufacturers require CD-SEM measurement systems to measure the critical dimension of the miniature-sized circuits in a semiconductor and to assure accuracy in manufacturing, Advantest said.
Traditional CD-SEM systems lack the sensitivity to measure small variations in line and contact hole profiles.
Nanolithography system consisting of Electron Beam Exposure System and CD-SEM electron beam exposure system - equipment for the exposure of electron beam resists at wafer level for MEMS / NEMS and nanoelectronics.