tip-enhanced Raman scattering," Journal of Raman Specroscopy, vol.
absorption and short pulse-length performance, the system readily couples with all matrixes, resulting in long, steady signals and a uniform response throughout the periodic table while minimizing fractionation.
The system employs 13-nm radiation, a wavelenght which is a more than tenfold reduction in illumination wavelength from existing DUV (deep-UV
Optional second- and third-harmonic generators provide even higher power and tunability from deep-UV
to the visible.
But even more technologically esoteric products like Nikon's deep-UV
inspection system have the ability to improve the human condition by creating systems that ensure semiconductor products are of a high quality.
Dimensional metrology at the nanometer level (SEM/PPM) Nanometer-scale metrology with AFM Linewidth correlation Electrical linewidth and overlay metrology Optical CD and overlay metrology High-accuracy two-dimensional measurements Radiometric metrology for deep-UV
laser metrology for semiconductor photolithography