DXRLDeep X-Ray Lithography
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The patterned PMMA sheet fabricated by the DXRL process was used as the mother structure in the subsequent nickel electroforming.
As the exposed hard X-ray radiation was sufficiently blocked in the X-ray absorber, the thick PMMA microstructure having its plane image identical to the absorber layer could be obtained by the DXRL process as shown in Fig.
It should be noted that the thickness of SMM was reduced to 1.8 mm because of the polishing although the PMMA sheet used in the DXRL process had a thickness of 2.0 mm.
The convex surface of the microchannel was also found to be very smooth, verifying the advantage of the DXRL process utilized in this study.