HPLNHigh Performance-Low Noise
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The degradation reaction was carried out in a batch quartz reactor (40 x 20 x 36 [mm.sup.3]) placed in a thermostated chamber (25[degrees]C) under the UV light of a lamp (HPLN Philips 125 W) emitting at 365 nm.
The sensor incorporates High Performance-Low Noise (HPLN) technology and offers a pixel design and optimizing device that increases sensitivity and reduces noise levels, enabling broader ISO performance.