The deposition technique IPVD was presented in  as an improvement in filling of high-aspect-ratio features in microelectronics fabrication.
More complex model of IPVD  includes processes on the surface, the deposition itself including resputtering and movement of physisorbed particles on the surface.
It was shown that the RF power can effectively regulate electron density and consequently the ion-to-neutral flux fraction which is one of the crucial parameters in IPVD process.
Patients with other cardiovascular conditions (heart block, pacemakers, cardiomyopathy, and valvular heart disease) and ischemic peripheral vascular disease (IPVD) were at significantly greater risk of imminent hospitalization.
Specific interventions that might lead to avoided hospitalizations include administration of r-Hu-EPO; dietary counseling and nutritional supplements to avoid low protein and albumin values; avoidance of low diastolic blood pressure levels between schedule treatments; psychological logical counseling and psychiatric referrals; closer monitoring of pacemaker, arthritis, and IPVD patients; and improved phosphate and fluid management in relevant patients.