LPCVD

AcronymDefinition
LPCVDLow Pressure Chemical Vapor Deposition
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SPC is performed with LPCVD at a temperature below 560[degrees]C to form amorphous silicon.
At the heart of these coating capabilities for optics and other thin film technologies are DSI's patented MicroDyn[R] reactive sputtering technology enabling superior multilayer thin film coatings, and the company's IsoDyn[TM] LPCVD method that permits exceptionally conformal optical coatings on complex shapes and sizes.
1 LPCVD = Low-Pressure Chemical Vapor Deposition 2 PECVD = Plasma-Enhanced Chemical Vapor Deposition
In a typical TEOS LPCVD process, solid and powdery deposits form adjacent to the reaction chamber pump port.
Leybold's interstage purge-gas system also maintains high particle velocity through the pump, thus minimizing particle accumulations in the pump - particularly important for processes like LPCVD nitride.
The TCO 1200 LPCVD manufacturing system deposits a single layer that optimizes the tandem absorber stack with very high haze light scattering, very low sheet resistance and excellent transmission characteristics.
Contract award: Delivery of the complete 2 sets of horizontal high-temperature furnaces for oxidation of dry, wet and annealing processes wafers with devices for depositing layers of silicon nitride and polysilicon by LPCVD for the project Centre for Advanced Materials and Technologies under the Operational Programme Innovative Economy 2007-2013, co-financed with European Regional Development Fund.
The installation includes the innovative Oerlikon Solar LPCVD TCO front and back contact technology, which has clearly proven its capability in mass production over the last 6 months.
PST produces vertical thermal processing systems for high-end Semiconductor applications ranging from annealing/oxidation to LPCVD process.
a manufacturer of diffusion and LPCVD furnaces for large scale production as well as the development of Semiconductor, Optoelectronic, MEMS, Photonic, and Photovoltaic devices.
Under this agreement, TEL designates IMI as a strategic supplier making IMI products as its preferred furnace consumables and has an exclusive right to use IMI's SiFusion[TM] 100% pure poly silicon furnace consumables for LPCVD Poly applications.