(redirected from Plasma-enhanced chemical vapor deposition)
Also found in: Wikipedia.
PECVDPlasma-Enhanced Chemical Vapor Deposition
References in periodicals archive ?
Airco developed a "QLF" process for plasma-enhanced chemical vapor deposition, which differs from the commercial sputtering and electron-beam evaporation processes in the important respect that it is not a line-of-sight process and therefore can coat 3D objects such as rigid containers.