RTCVDRapid Thermal Chemical Vapor Deposition
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References in periodicals archive ?
Thin film depositions of Si-C-N have been carried out by plasma and ion-assisted deposition, chemical vapour deposition, magnetron sputtering, microwave, and electron cyclotron resonance plasma enhanced chemical vapour (ECRPECVD), ion implantation, pulsed laser deposition, and rapid thermal chemical vapour deposition (RTCVD).
* Equipment and Process Fault Detection in PolySi RTCVD, North Carolina State Univ.