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RIERisico Inventarisatie en Evaluatie (Italian: Risk Inventory and Evaluation)
RIEReactive Ion Etching
RIERoyal Infirmary of Edinburgh (Scotland, UK)
RIEResources for Infant Educarers (California)
RIERevista de Investigación Educativa (Spanish: Review of Educational Research)
RIERapid Improvement Event
RIERecognised Investment Exchange (UK)
RIERectification Interval Extension (aviation)
RIERight Inboard Elevon (US NASA)
RIERice Lake, Wisconsin (Airport Code)
RIEReceive Interrupt Enable
RIERegards sur l'Intelligence Economique (French: Views on Economic Intelligence)
RIERemote Instrument Enclosure
RIERegional Information Exchange
RIERésidence Internationale d'Etudiants (French: International Student Residence)
RIERemote Interface Electronics
RIERadar Interface Equipment
RIERequirements-Induced Error
RIERéseau International EPIVAC (Épidémiologie & Vaccinologie; French: Research International EPIVAC (Epidemiology and Vaccinology))
RIERéalisations Industrielles Electriques (French: Industrial Electrical Work)
RIERencontres de l'Initiative Economique (French: Economic Initiative Encounters)
References in periodicals archive ?
After reactive ion etching process, the rough surface was composed of pyramid shape structure, which could be helpful to effectively enhance the bonding strength of the film and the substrate.
We showed that a low temperature of PMMA curing (<115[degrees]C) combined with low oxygen gas pressure (-30mTorr) and low power (-8-12 Watts) produced ribbon patterns on graphene using a PMMA mask (-50 nm width, -60 nm thick) in a reactive ion etching chamber (MARCH CS-1701).
In order to have an in situ (real-time) etch-depth control with this demanding accuracy we have successfully employed an adequate measurement techniques, by transferring the concept of reflectance anisotropy spectroscopy (RAS), which is well-known from epitaxy for growth control by now [29-35], to reactive ion etching (RIE) of monocrystalline semiconductor layer sequences [36-39].
Complex methods, such as the stepper photolithography and deep reactive ion etching, also known as the Bosch process, have helped researchers achieve some of these goals.
Through the use of deep reactive ion etching it is possible to create complex and arbitrary geometries within the resonating structure.
Plasma etching resistance was tested with multifunctional magnetically enhanced reactive ion etching machine.
In mPhase's Case, a honeycomb design is etched through deep reactive ion etching (DRIE), where the honeycomb pores are etched through the entire silicon wafer.
Tegal said that the move completes the transition associated with its acquisition of the Deep Reactive Ion Etching (DRIE) products and related intellectual property for 3D packaging and MEMS devices from France-based Alcatel Micro Machining Systems (AMMS) and Alcatel Lucent (Euronext Paris:ALU) (NYSE:ALU).
Lead project researcher Aleksander Angelov says the molds are made of silicon using standard micro-machining techniques including electron-beam lithography and deep reactive ion etching. A plasma polymerization process deposits a 5- to 10-nm-thick release coating on the mold surface.
Deep reactive ion etching system using coupled inductive plasma.
Chemical etching or chemically enhanced physical etching (i.e., reactive ion etching) is in general not appropriate for most complex oxides and some metal alloys of high interest (besides other materials).
An inductively coupled plasma reactive ion etching system (ICP-2B, Chuangweina, Beijing) was utilized to etch the PS beads and Si substrate.
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