SEMATECH


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AcronymDefinition
SEMATECHSemiconductor Manufacturing Technology
References in periodicals archive ?
Under his leadership, SEMATECH partnered with the College of Nanoscale Science and Engineering (CNSE) to launch the Resist and Materials Development Center, the world's preeminent EUV imaging resource, and the EUV Mask Infrastructure (EMI) Partnership which focuses on critical EUV tool development activities.
A demonstration of the e-handbook was featured as part of the Quality and Productivity Research Conference, hosted by International SEMATECH in Austin, Texas.
These collaborative attempts -- one a grassroots effort and the other, SEMATECH, designed as more of a top-down program--reflect the changing nature of the nation's research enterprise as investigators respond to what many perceive as an economic crisis.
A second consortium, SEMI/SEMATECH, will facilitate timely information flow between SEMATECH and 150 equipment and materials handling vendors regarding procurement and requirements via a series of technical planning workshops.
Since 2006, Poongsan and SEMATECH have partnered in tool and process development projects that have successfully demonstrated the technical merits of a high pressure annealing furnace.
We are enthusiastic about sharing our progress on some of the most critical aspects of the development of EUV infrastructure," said Stefan Wurm, director of lithography at SEMATECH.
With such partnerships, SEMATECH is continuing our commitment to develop and deliver the infrastructure required for this critical next-generation technology.
SEMATECH announced today that researchers have reached a significant milestone in reducing tool-generated defects from multi-layer deposition of mask blanks used for extreme ultraviolet lithography (EUVL), bringing that technology a step closer to high-volume manufacturing.
I am delighted to have a leader of Mike's caliber, and with his extensive experiences in semiconductor process and equipment R&D and manufacturing, he brings a wealth of real-world processing knowledge that will be an invaluable asset to drive our nanodefect program at SEMATECH.
As a resist member of SEMATECH's lithography program, Kumho will team with SEMATECH engineers to accelerate the development of EUV materials and resists for use at the 22 nm node and beyond.
As a resist member of SEMATECH's lithography program, Inpria will collaborate with SEMATECH engineers on critical issues for resist in extreme ultraviolet (EUV) lithography.
As a member of this program, centrotherm will closely collaborate with experts from SEMATECH's FEP research team, to develop plasma-based low temperature techniques using SEMATECH test structures.