SPIMOXSeparation by Plasma Implantation of Oxygen
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The research agreement between Komatsu and SiGen allows for the cooperative study of PIII technology use for the implantation of oxygen into silicon, a fundamental step in the new oxygen implantation process called SPIMOX (Separation by Plasma IMplantation of Oxygen).
SPIMOX delivers higher throughput and cuts costs during the key oxygen implant step, overcoming the obstacles which have prevented the SIMOX process from achieving the required cost for mainstream SOI use.
Henley, president and CEO of Silicon Genesis states, "We are very pleased to announce this sale of our PIII equipment to Komatsu and formalization of the research agreement for SPIMOX.