TCVD

(redirected from Thermal Chemical Vapor Deposition)
AcronymDefinition
TCVDThermal Chemical Vapor Deposition
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References in periodicals archive ?
Elahi, "Synthesis of carbon nanotubes using the cobalt nanocatalyst by thermal chemical vapor deposition technique," Journal of Alloys and Compounds, vol.
Yu, "Catalyst effect on carbon nanotubes synthesized by thermal chemical vapor deposition," Chemical Physics Letters, vol.
Contributors cover epitaxy by rapid thermal chemical vapor deposition, molecular beam epitaxy growth techniques, ultra-high vacuum and chemical vapor deposition, defects and diffusion in SiGe and stained Si, stability constraints in SiGe epitaxy, electronic properties of strained Si/SiGe and silicon alloys, carbon doping and contact metallization of SiGe, and selective etching techniques for SiGe/SI.