LITHO

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AcronymDefinition
LITHOLithograph
LITHOLithography
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References in periodicals archive ?
Extensive analysis of the global lithography inks market trends from 2018 to 2026 to identify growth opportunities and analyze market developments
Nanoscribe's two-photon greyscale lithography technology combines greyscale lithography with two-photon polymerisation to print freeform optics very accurately.
The new lab will enable researchers from the organisations to experiment with EUV lithography at higher numerical aperture (NA) in the manufacturing of advanced nanoscale devices.
Lithography, literally 'stone-drawing', is a printing process that uses varying techniques with stone or metal plates that have been etched in such a way to guide ink to desired areas.
Caption: Assegnazione con De Seingalt III , 2017 Found antique engravings, digital images, maps, various papers, lithography, chine colle, 20.75" by 17" PUBLISHED AT SHARKS INK, LYONS, CO
E-beam lithography, on the other hand, works with a much higher resolution--in the region of 500,000 dpi.
Consequently, the semiconductor equipment and materials industry is urgently pursuing a range of alternative microelectronics manufacturing technologies including finFETs, 3D-IC, and multiple patterning lithography.
TEHRAN (FNA)- Experts from Iran Institute for Color Science and Technology used zinc oxide nanoparticles to produce an antibacterial nanocomposite from offset lithography inks which can be applied for lithography on various types of packaging of foodstuff, medications and cosmetics.
31 May 2013 - Dutch lithography systems provider ASML Holding NV (AMS:ASML) said it had closed the EUR1.95bn (USD2.5bn) acquisition of US lithography light sources supplier Cymer Inc (NASDAQ:CYMI).
ASML Holding NV (NASDAQ:ASML) (Amsterdam:ASML), a provider of lithography systems, revealed on Friday that the Antitrust Division of the United States Department of Justice cleared the merger between the company's affiliates and Cymer Inc (Nasdaq:CYMI), a developer of lithography light sources.
This prototype is based on a disruptive nanolithography method (Rolling Mask Lithography - RML(TM)) developed by Rolith, Inc.
This can be done by using various techniques such as precision engineering and lithography and has been developed and refined by the semiconductor industry over the past 30 years.